Principal Scientist Lithography Equipment and Patterning Process Control

The Advanced Patterning Center (APC) is a joint initiative launched by imec and ASML to address the upcoming scaling challenges associated with the chip industry’s move towards single digit nanometer dimensions. The center is located at the imec campus in Leuven (near Brussels) and is expected to grow continuously over the next couple of years. The APC is associated with the imec Supplier Hub, an initiative involving many leading edge semiconductor equipment suppliers, aimed at creating a collaborative environment to investigate the practical interactions between all the different steps in the chip patterning process. The APC and Supplier Hub will use actual devices to analyze and optimize process steps as well as materials and device architecture choices, while applying integrated metrology. For the APC we are looking for a Principal Scientist Lithography Equipment and Patterning Process Control (m/f). As Principal Scientist for Lithography Equipment and Patterning Process Control: - You will be the lead interface with ASML on multiple advanced scanner and process control strategies and developments. - You will guide technical direction of the Advanced Patterning Center in use of state-of-the-art EUV and DUV scanners. - You will ensure optimal lithographic strategy for imec’s wide range of integrated logic and memory CMOS applications and process flows. - You will understand the impacts of process flow (CMP, etch, depositions) for lithography (alignment, topography, stress).